2023

The 30th

None

2022

The 29th

Junya Osada(OXIDE Corporation)
Shota Asai(OXIDE Corporation)
Akio Miyamoto(OXIDE Corporation)
Masaaki Komai(OXIDE Corporation)
Shinichi Nakanome(OXIDE Corporation)

“Establishment of mass-production technology for LGSO single crystal for most-advanced PET”

2021

The 28th

None

2020

The 27th

Takayuki Suzuki(SCIOCS Company Limited)
Toshiro Kitamura(SCIOCS Company Limited)
Takehiro Yoshida(SCIOCS Company Limited)
Masatomo Shibata(SCIOCS Company Limited)

“Development of mass production technology for highly uniform and low defect density Gallium Nitride substrates by Void-Assisted-Separation method”

2019

The 26th

Katsuya Teshima(Director, Research Initiative for Supra-Materials, Professor, Department of Materials Chemistry, Shinshu University)

“Flux growth of sodium titanate crystals and their application for novel water-purifier materials”

Tomio Kajigaya(Sumitomo Metal Mining Co., Ltd.)
Taizo Kitagawa(Sumitomo Metal Mining Co., Ltd.)
Katsutoshi Aoki(Sumitomo Metal Mining Co., Ltd.)
Akira Terashima(Sumitomo Metal Mining Co., Ltd.)
Yuusuke Nishimura(Sumitomo Metal Mining Co., Ltd.)
Toshio Kochiya(Sumiko Kunitomi Denshi Co., Ltd.)

“Development of mass production technology for lithium tantalate substrate”

2018

The 25th

Yuui Yokota(Associate Professor, Tohoku University)
Yuji Ohashi(Associate Professor, Tohoku University)
Akira Yoshikawa(Professor, Tohoku University)
Kei Kamada(C&A Corporation)
Yasuhiro Shoji(C&A Corporation)
Kenji Inoue(Piezo Studio Inc.)

“Development of Growth and Device Techniques of Novel Langasite-Type Piezoelectric Single Crystals”

2017

The 24th

None

2016

The 23rd

Hiroshi FUJIOKA(Professor, Institute of Industrial Science, The University of Tokyo)
Jitsuo OHTA(Research Associate, Institute of Industrial Science, The University of Tokyo)
Atsushi KOBAYASHI(Project Research Associate, Institute of Industrial Science, The University of Tokyo)
Kohei UENO(Project Research Associate, Institute of Industrial Science, The University of Tokyo)

“Development of Fabrication Processes for Nitride Semiconductor LEDs on Amorphous Substrates”